The KLA-Tencor's eV 300 is an advanced, fully automated Scanning Electron Microscope (SEM) designed specifically for high-volume review and analysis in a manufacturing environment. Integrated automatic defect classification (ADC) capabilities, flexible tilt/rotation, voltage contrast review, high aspect ratio interconnect (HARI) imaging, and landing energy up to 19 keV (which enables unambiguous material identification) make it ideal for both in-line monitoring and engineering analysis applications for 0.13 micron and smaller design rules.
The eV300 reviews, classifies, and provides elemental data for defects captured by KLA-Tencor's comprehensive suite of unpatterned and patterned wafer inspection systems. Integration with Klarity Defect, KLA-Tencor's automated analysis and defect data management system, provides capabilities for further analysis, defect control, and excursion monitoring. The eV300 delivers a four-fold increase in productivity compared to manual SEM review systems, and can be configured to handle 150 mm, 200 mm, or 300 mm wafers. IMPACT SEM ADC Enables more rapid, consistent and accurate sourcing of yield-limiting defects that affect device performance and reliability.
