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Category: Secondhand Equipment for Sale - Main > Semiconductor Production > Wafer Cleaning

NAPCO RTMH-G3291 WESTLINE ETCHER (2003) Automated wet clean and etch system

  Listing Details for NAPCO RTMH-G3291 WESTLINE ETCHER (2003) Automated wet clean and etch system  
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Listing ID: 391754
Seller Info nowosad
Location: California
Country: United States
. EquipFlip Seller Since:  Jul 2011
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NAPCO RTMH-G3291 WESTLINE ETCHER (2003) Automated wet clean and etch system

EquipFlip Asking Price:

$0.00 -*Accepting Offers
  • Manufacturer:
  • Model #:
  • Year (or range of years):
  • Serial #:
  • Napco
  • RTMH-G3291 Westline Etcher
  • 2003
  • 2005
Item Condition: Excellent
Warranty Terms: No Warranty
Payment Terms: Prepayment
Ad Type: For Sale
Ad Inquiries: Dealer inquiries welcomed.
Privacy: Please do not contact advertiser regarding service or product solicitation.
Quantity Available: 1
Delivery: In Stock
.

  Photos for NAPCO RTMH-G3291 WESTLINE ETCHER (2003) Automated wet clean and etch system  

  • Napco 1
  • Napco 2
  • Napco 3
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  • Napco 5
  • Napco 6

 
Description for NAPCO RTMH-G3291 WESTLINE ETCHER (2003) Automated wet clean and etch system
 
NAPCO RTMH-G3291 WESTLINE ETCHER S/N 2005 (2003)  Automated industrial wet cleaning and etching system with very high through-put carousel type over-head transport system. System is 18' wide X 44' long X 11' high. Current application: cleaning, etching, rinsing, and drying of large batches of 6 inch silicon wafers. 32 carrier arms, each arm supports one large basket that holds 8 cassettes of 25, 6inch wafers. Current through-put recipe allows for 3,600 wafers per hour of production. PLC controls, automatic or manual chemical make up and replenishment. All the wet processing tanks are poly-propylene and of varing sizes and function. Current tank stations and process flow: manual load of wafer cassettes into carrier basket. Step 1:  detergent clean, 3 stations, approx. 300 gallon capacity, dimensions, 72" long, 43" wide, 27" deep. Step 2: cascading DI rinse, 4 stations, approx. 350 gallon capacity, dimensions, 93" long,  39" wide,  27" deep. Step 3: heated etch, 175°F, 1 station, approx. 75 gallon capacity, dimensions, 21" long, 43" wide, 24" deep. Step 4: Hot DI rinse, 120°F, 1 station, approx. 75 gallons, dimensions, 21" long, 39" wide, 24" deep. Step 5: heated etch, 175°F, 3 stations, approx. 250 gallons, dimensions, 69" long, 43" wide, 24" deep. Step 6: heated etch, 175°F, 3 stations, approx. 230 gallons, dimensions, 72" long, 39" wide, 24" deep. Step 7: Warm cascading DI rinse, 120°F, 1 station, approx. 100 gallons, dimensions, 27" long, 43" wide, 24" deep. Step 8: Warm cascading DI rinse, 120°F, 3 stations, approx. 230 gallons, dimensions, 72"long, 39" wide, 24" deep. Step 9: Heated neutralization, 120°F, 3 stations, approx. 250 gallons, dimensions, 69" long, 43"wide, 24" deep. Step 10: Warm cascading DI rinse, 100-180°F, 5 stations, approx. 375 gallons, dimensions, 117" long, 39" wide, 24" deep. Step 11: Heated Drier box, 180°F, S.S. construction, 3 stations, 66" long, 43" wide, 24" deep. Utilizes operator load and unload of process carriers. 35 carriers included. Control systems included. Spare parts available.
 

 
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